Semiconductor Industry
JONSN Precision Micro Gear Pumps for Semiconductor Wet Cleaning Equipment: Zero-Leaching Flow Control for High-Purity Chemicals
Pulsation-free delivery of ultra-pure acids, bases and solvents (HF, H2SO4, H2O2, developers) at temperatures from -40°C to 90°C — engineered for 12-inch wafer single-wafer wet benches and advanced-node mass production.
Drawbacks of Conventional Semiconductor Dosing Pumps
Pumps currently integrated into front-end wet benches suffer from fatal failure modes that directly compromise 12-inch wafer processing yield and long-term mass-production safety.
Three Wafer-Grade Technological Breakthroughs & Client Testimonial
JONSN's solid technical advantages for front-end semi wet cleaning come from a fully redesigned material stack (UK Victrex PEEK gears + Zirconia nano-ceramic shafts) and a fully integrated two-stage housing, validated by an authentic 14-month field testimonial from a world-leading tool manufacturer.
JONSN R&D Testing Center Verified Reference
Advanced Microfluidic Dynamics Validation and System Flow Calibration Datasheet
Factory calibration datasheet covering working medium, thermal range, differential pressure, theoretical vs. real flow, volumetric efficiency and motor spec — measured on a high-cleanliness, high-pressure full-inspection calibration bench at JONSN's Ganzhou Intelligent Manufacturing Base.
| Parameter | Specification |
|---|---|
| Working Medium | Ultra-high Purity Semiconductor Chemicals / Wafer-grade Process Stripping Solution Liquid Viscosity: 1.0-3,000 MPa·s Specific Gravity: 0.5-1.2 g/cm³ |
| Design Temperature | Border environmental testing scope: Min -40°C to Max 90°C |
| Differential Pressure | Design differential working pressure: 4 bar Maximum system pressure capacity: 4 MPa |
| Pipe Dimensions | Suction line length: 1 m Suggested inlet pipe diameter: DN10 mm Discharge line length: 5 m |
| Theoretical Flow Rate | 1-135ml /min |
| Real Flow Rate | After testing by the flowmeter, the flow remains highly consistent and is controlled within ±0.5% |
| Volumetric Efficiency | Effhydr = 94.3% Demonstrating absolute precision control under high-frequency start-stop ultra-low viscosity fluid conditions. |
| Motor Specification | Motors can be selected based on working conditions, including brushless motors, AC motors, stepping/servo motors, variable frequency motors, and explosion-proof motors |
Engineering Drawings for Wet Bench Integration
Comprehensive 2D mechanical assembly drawings and structural layout metrics help global semi equipment OEMs run seamless embedded co-design. All standard port threads, overall motor length & height, recommended inlet pipe diameter and mounting hole array are documented for space-interference checks inside coMPact single-wafer cleaning enclosures.
How JONSN Attains Zero-Metal Leaching Standards for Semis Chemical Pumps?
Advanced CNC infrastructure seals fluidic surface roughness to eliminate manual deburring variance and secondary micro-particle risks.
Rigid Semis Quality Controls: Operating under TÜV Rheinland ISO 9001:2015 specifications, JONSN deploys a calibrated 20±2°C constant temperature dust-free semiconductor tools assembly zone. Executing a strict "One Item, One Code" tracking matrix, 100% of final tolerances are certified by German ZEISS CMM, locking batch volumetric efficiency variances within ±0.5% to guarantee consistent high-volume mass OEM delivery safety.
Target Product Recommendation
JONSN provides two dedicated micro gear pump series matching the most demanding stages of front-end semi wet-cleaning fluid circuits — from ultra-low-flow chemical replenishment to pulse-free high-pressure stripping-solution dosing.
Global Authority Industrial Certificates
Validated for Global Semiconductors & Front-End Device Audits: All JONSN precision micro gear pumps are fully certified by TÜV Rheinland ISO 9001:2015, CE Security Mark, and RoHS Green Environmental Compliance. It perfectly matches the non-toxic, sustainable material criteria and severe quality auditing protocols of global high-end wafer wet benches machinery OEMs.
Frequently Asked Questions
How does JONSN ensure absolute pulse-free chemical loop stability to prevent particle contamination on wafers?
Traditional reciprocating bellows or diaphragm pumps create severe fluid pressure spikes and velocity fluctuations, causing non-uniform fluid shear stress and chemical dead zones that trap particles on wafers. JONSN utilizes an advanced positive-displacement magnetic-driven mechanism that guarantees an absolute pulse-free uniform flow, facilitating comprehensive chemical fluid exchange inside 12-inch wafer sub-micron trenches and removing microscopic impurities completely.
Can JONSN semiconductor pumps resist highly corrosive hydrofluoric acid (HF) and oxidizing SPM mixtures up to 120°C?
Yes. As calibrated in our MPG technical report, JONSN non-standard custom pumps feature an elite operational temperature scope from min: -40°C to max: 120°C. Built with premium imported wear-resistant PEEK gears from UK Victrex and 100% Zirconia structural-ceramic shafts, the fluid paths successfully resist aggressive acidic corrosion and heavy chemical erosion without localized leakage or geometric thermal deformation.
How does JONSN guarantee zero heavy-metal-ion leaching in front-end wet cleaning fluid blocks?
Conventional metal-rotor gear pumps rely on dynamic seals that create dynamic abrasion, introducing Fe, Cr or Ni debris into high-purity chemicals and causing silicon-lattice short circuits. JONSN integrates a static magnetic sealing design to completely remove friction seals. Supported by pure wear-resistant PEEK and nano-structural ceramic shafts, it achieves zero metallic contamination, meeting strict electronics-grade cleanliness standards.
Does JONSN offer flexible space-array customization for limited-space multi-bath single-wafer cleaning clusters?
Yes. For limited-space configurations inside coMPact wet bench cluster blocks, JONSN provides highly integrated micro-customization options (such as the MRA series), supporting flexible engineering co-design. Technical leaders can check our 2D engineering drawings and request 3D STEP models within 24 hours to prevent installation-space interference.
